Research of Chain Plasmochemical Synthesis of Superdispersed Silicon Dioxide by Pulsed Electron Beam
نویسندگان
چکیده
منابع مشابه
Pulsed Electron Beam Annealing of Arsenic-implantation Damage in Silicon
A SPIRE-300 pulsed electron beam processor has been used t o recrystallize (100) and (111) 15 Si wafers implanted with As (140 keV 10 cm-2). The machine parameters have been selected t o obtain an electron energy deposition profik convenient for melting of the silicon surface 2 down t o 1 J/cm . The best regrawth layer quality and As incorporation wereobtained with electron energy densities in ...
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15 صفحه اولTrimming of silicon ring resonator by electron beam induced compaction
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ژورنال
عنوان ژورنال: IEEJ Transactions on Fundamentals and Materials
سال: 2004
ISSN: 0385-4205,1347-5533
DOI: 10.1541/ieejfms.124.483